The matrix elements of K i α,j β are calculated by finite difference of the force F i α with Smad3 phosphorylation respect to r j β such as (6) The force F i α is obtained from the derivative of E with respect to

r i α where E is the total energy of the system and r i α is the atomic coordinate of the ith atom along the α direction. Therefore F i α (+Δ R j β ) indicates the force of ith atom along the α direction Captisol generated by the jth atom along the β direction with a displacement of +Δ R from the pristine wire’s equilibrium positions. Here Δ R is a displacement, for which we take Δ R=2×10−4Å in the present work. As for the total energy formula E, we use the interatomic Tersoff-Brenner potential [14, 15] for silicon and carbon atoms. Here we note that according to the recent calculation for the thermal conductance of SiNWs with no defects and with edge atoms passivated by hydrogen, the force constants calculated by the ab initio density

functional theory for H-passivated SiNW produce almost the same thermal conductance with those obtained from the interatomic Tersoff potential without H passivation [11]. Therefore, we employ here the interatomic Tersoff potential for SiNW. Results and discussion First, let us see the temperature dependence of thermal conductance. Figure 2 shows the thermal conductance of a SiNW with RXDX-101 mouse 1.5 nm in diameter and that of a DNW with 1.0 nm in diameter as a function of temperature. Here, no defects are present for these two wires to see the temperature dependence of thermal conductance clearly. Generally, thermal conductance is zero at 0 K because no phonons

are excited for the propagation of heat. With temperature increases, the thermal conductance increases monotonically without any scatterings and saturates at high temperature, where the dependence changes from material to material. This monotonic increase of thermal conductance reflects the phonon occupation according to the Bose-Einstein distribution and is quite different from the electron conductance in which only a small number of electrons around Fermi level contributes to the conduction. DNA ligase We note that the behavior at high temperature near the saturation is determined by the highest phonon energy of each material, which is observed in the phonon band structure. For SiNW case, the thermal conductance starts to saturate around 300 K, because almost all phonons of SiNW are excited for thermal conduction at around 300 K. We can see that the DNW with 1.0-nm diameter has a higher thermal conductance than the SiNW with 1.5 nm at the temperature higher than 150 K. For the DNW, the thermal conductance starts to saturate around 800 K, which is also determined by the highest phonon energy as can be seen in the phonon band structure of the DNWs. Figure 2 Thermal conductance of SiNW and DNW. Red and black solid lines show thermal conductances of 〈100〉 SiNW with 1.5 nm in diameter and 〈100〉 DNW with 1.0 nm in diameter.